New Yield-Aware Mask Strategies
نویسندگان
چکیده
In this paper, we provide new yield-aware mask strategies to mitigate emerging variability and defectivity challenges. To address variability, we analyze CD variability with respect to reticle size, and its impact on parametric yield. With a cost model that incorporates mask, wafer, and processing cost considering throughput, yield, and manufacturing volume, we assess various reticle strategies (e.g., single layer reticle (SLR), multiple layer reticle (MLR), and small and large size) considering field-size dependent parametric yield. To address defectivity, we compare parametric yield due to EUV mask blank defects for various reticle strategies in conjunction with reticle floorplan optimizations such as shifting of the mask pattern within a mask blank to avoid defects being superposed by performance-critical patterns of a design.
منابع مشابه
Cost-driven mask strategies considering parametric yield, defectivity, and production volume
We provide new yield-aware mask strategies to mitigate emerging variability and defectivity challenges. To address variability, we analyze critical dimension variability with respect to reticle size and its impact on parametric yield. With a cost model that incorporates mask, wafer, and processing cost, considering throughput, yield, and manufacturing volume, we assess various reticle strategie...
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